Parallel direct-write nanolithography using arrays of optically trapped microlenses

Euan McLeod, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We use Bessel beam optical traps to self-position arrays of microsphere objectives near surfaces. Pulsed laser illumination of these objectives is used to perform near-field direct-write subwavelength optical nanopatterning with 100 nm feature sizes.

Original languageEnglish (US)
Title of host publication2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009
PublisherIEEE Computer Society
ISBN (Print)9781557528698
DOIs
StatePublished - 2009
Event2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009 - Baltimore, MD, United States
Duration: Jun 2 2009Jun 4 2009

Publication series

Name2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009

Other

Other2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009
CountryUnited States
CityBaltimore, MD
Period6/2/096/4/09

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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    McLeod, E., & Arnold, C. B. (2009). Parallel direct-write nanolithography using arrays of optically trapped microlenses. In 2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009 [5226017] (2009 Conference on Lasers and Electro-Optics and 2009 Conference on Quantum Electronics and Laser Science Conference, CLEO/QELS 2009). IEEE Computer Society. https://doi.org/10.1364/cleo.2009.cthg2