Organic vapor phase deposition for the growth of large area organic electronic devices

Richard R. Lunt; Brian E. Lassiter; Jay Burton Benziger; Stephen R. Forrest

doi:10.1063/1.3271797

Organic vapor phase deposition for the growth of large area organic electronic devices

Richard R. Lunt, Brian E. Lassiter, Jay Burton Benziger, Stephen R. Forrest

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

We demonstrate that material utilization efficiencies of 50% and deposition nonuniformities ≤ 2.5% are achievable over substrate diameters of 200 mm using a simplified, organic vapor phase deposition (OVPD) system. The OVPD system is used to demonstrate doped electrophosphorescent organic light emitting diodes whose performance is comparable to those grown by vacuum thermal evaporation. Through continuum modeling, we demonstrate that analogous systems whose chamber dimensions are comparable to the substrate width are scalable to substrate sizes of at least 1500×1800 mm² with deposition nonuniformities between 1.5% and 2.5%. These results indicate that OVPD is useful in the large area deposition of displays, lighting, and other organic electronic devices.

Original language	English (US)
Article number	233305
Journal	Applied Physics Letters
Volume	95
Issue number	23
DOIs	https://doi.org/10.1063/1.3271797
State	Published - 2009

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.3271797

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@article{a0211d2cef6140e6acae9d7dfa588603,

title = "Organic vapor phase deposition for the growth of large area organic electronic devices",

abstract = "We demonstrate that material utilization efficiencies of 50% and deposition nonuniformities ≤ 2.5% are achievable over substrate diameters of 200 mm using a simplified, organic vapor phase deposition (OVPD) system. The OVPD system is used to demonstrate doped electrophosphorescent organic light emitting diodes whose performance is comparable to those grown by vacuum thermal evaporation. Through continuum modeling, we demonstrate that analogous systems whose chamber dimensions are comparable to the substrate width are scalable to substrate sizes of at least 1500×1800 mm2 with deposition nonuniformities between 1.5% and 2.5%. These results indicate that OVPD is useful in the large area deposition of displays, lighting, and other organic electronic devices.",

author = "Lunt, {Richard R.} and Lassiter, {Brian E.} and Benziger, {Jay Burton} and Forrest, {Stephen R.}",

note = "Funding Information: The authors thank Dr. Fan Yang for assisting in the early stages of machine design, and David Pitts and Andrew Bass from Angstrom Engineering (Kitchener, Ontario) for their expert advice and construction of the OVPD system. We also thank the Department of Energy EERE Program, Universal Display Corp., and Global Photonic Energy Corp. for their support of this work.",

year = "2009",

doi = "10.1063/1.3271797",

language = "English (US)",

volume = "95",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "23",

}

TY - JOUR

T1 - Organic vapor phase deposition for the growth of large area organic electronic devices

AU - Lunt, Richard R.

AU - Lassiter, Brian E.

AU - Benziger, Jay Burton

AU - Forrest, Stephen R.

N1 - Funding Information: The authors thank Dr. Fan Yang for assisting in the early stages of machine design, and David Pitts and Andrew Bass from Angstrom Engineering (Kitchener, Ontario) for their expert advice and construction of the OVPD system. We also thank the Department of Energy EERE Program, Universal Display Corp., and Global Photonic Energy Corp. for their support of this work.

PY - 2009

Y1 - 2009

N2 - We demonstrate that material utilization efficiencies of 50% and deposition nonuniformities ≤ 2.5% are achievable over substrate diameters of 200 mm using a simplified, organic vapor phase deposition (OVPD) system. The OVPD system is used to demonstrate doped electrophosphorescent organic light emitting diodes whose performance is comparable to those grown by vacuum thermal evaporation. Through continuum modeling, we demonstrate that analogous systems whose chamber dimensions are comparable to the substrate width are scalable to substrate sizes of at least 1500×1800 mm2 with deposition nonuniformities between 1.5% and 2.5%. These results indicate that OVPD is useful in the large area deposition of displays, lighting, and other organic electronic devices.

AB - We demonstrate that material utilization efficiencies of 50% and deposition nonuniformities ≤ 2.5% are achievable over substrate diameters of 200 mm using a simplified, organic vapor phase deposition (OVPD) system. The OVPD system is used to demonstrate doped electrophosphorescent organic light emitting diodes whose performance is comparable to those grown by vacuum thermal evaporation. Through continuum modeling, we demonstrate that analogous systems whose chamber dimensions are comparable to the substrate width are scalable to substrate sizes of at least 1500×1800 mm2 with deposition nonuniformities between 1.5% and 2.5%. These results indicate that OVPD is useful in the large area deposition of displays, lighting, and other organic electronic devices.

UR - http://www.scopus.com/inward/record.url?scp=71949109388&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=71949109388&partnerID=8YFLogxK

U2 - 10.1063/1.3271797

DO - 10.1063/1.3271797

M3 - Article

AN - SCOPUS:71949109388

SN - 0003-6951

VL - 95

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 23

M1 - 233305

ER -

Organic vapor phase deposition for the growth of large area organic electronic devices

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