Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source

  • S. S. Kim
  • , S. Hamaguchi
  • , N. S. Yoon
  • , C. S. Chang
  • , Y. D. Lee
  • , S. H. Ku

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

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