New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation

J. Tanaka; C. F. Abrams; D. B. Graves

doi:10.1116/1.582279

New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation

J. Tanaka, C. F. Abrams, D. B. Graves

Research output: Contribution to journal › Article › peer-review

65 Scopus citations

Abstract

The C-F interatomic potential of fluorocarbon is described by molecular dynamics simulation method. The potential is based in Tersoff's bond order type potential, called the reactive empirical bond-order (REBO) potential. The simulation traces the trajectories of all molecules in a system. The sputtering yields of carbon by Ar ion is calculated to confirm the validity of the REBO-type potential to ion surface reactions.

Original language	English (US)
Pages (from-to)	938-945
Number of pages	8
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	3
DOIs	https://doi.org/10.1116/1.582279
State	Published - May 2000
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.582279

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@article{25d2562d27964445b2d1d70dfb683eb7,

title = "New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation",

abstract = "The C-F interatomic potential of fluorocarbon is described by molecular dynamics simulation method. The potential is based in Tersoff's bond order type potential, called the reactive empirical bond-order (REBO) potential. The simulation traces the trajectories of all molecules in a system. The sputtering yields of carbon by Ar ion is calculated to confirm the validity of the REBO-type potential to ion surface reactions.",

author = "J. Tanaka and Abrams, {C. F.} and Graves, {D. B.}",

year = "2000",

month = may,

doi = "10.1116/1.582279",

language = "English (US)",

volume = "18",

pages = "938--945",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3",

}

TY - JOUR

T1 - New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation

AU - Tanaka, J.

AU - Abrams, C. F.

AU - Graves, D. B.

PY - 2000/5

Y1 - 2000/5

N2 - The C-F interatomic potential of fluorocarbon is described by molecular dynamics simulation method. The potential is based in Tersoff's bond order type potential, called the reactive empirical bond-order (REBO) potential. The simulation traces the trajectories of all molecules in a system. The sputtering yields of carbon by Ar ion is calculated to confirm the validity of the REBO-type potential to ion surface reactions.

AB - The C-F interatomic potential of fluorocarbon is described by molecular dynamics simulation method. The potential is based in Tersoff's bond order type potential, called the reactive empirical bond-order (REBO) potential. The simulation traces the trajectories of all molecules in a system. The sputtering yields of carbon by Ar ion is calculated to confirm the validity of the REBO-type potential to ion surface reactions.

UR - http://www.scopus.com/inward/record.url?scp=0034187093&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034187093&partnerID=8YFLogxK

U2 - 10.1116/1.582279

DO - 10.1116/1.582279

M3 - Article

AN - SCOPUS:0034187093

SN - 0734-2101

VL - 18

SP - 938

EP - 945

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3

ER -

New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation

Abstract

All Science Journal Classification (ASJC) codes

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