Abstract
We review three novel techniques whereby the highly uniform two-dimensional films produced by molecular beam epitaxy (MBE) can be further patterned into nanowires or nanostructures having quantum confinement in all three dimensions. These techniques have the potential of greatly extending the power and utility of the MBE method.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 151-159 |
| Number of pages | 9 |
| Journal | Bell System Technical Journal |
| Volume | 10 |
| Issue number | 3 |
| DOIs | |
| State | Published - 2005 |
| Externally published | Yes |
All Science Journal Classification (ASJC) codes
- General Engineering
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