Nanostencil fabrication with double exposure optical lithography for scalable resist-free patterning of metal on polymers

Joseph S. Katz, Woosung Park, Michael T. Barako, Aditya Sood, Mehdi Asheghi, Kenneth E. Goodson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Engineers require scalable processes for patterning nanoscale features on sensitive substrates to enable widespread manufacturability of advanced nanoelectronics. Nanostencils have shown promise, but prior work has relied on electron-beam (e-beam) and focused ion beam (FIB) processes. Nanostencils also frequently exhibit significant edge roughness. Here, we present a fabrication process for nanostencils using double exposure optical lithography and a novel capillary-driven lamination technique to reduce edge blurring, demonstrating sub-diffraction limit features of ~200nm on poly(methyl methacrylate) films. We demonstrate the utility of these stencils by generating metal patterns for use with the 3ω thermal conductivity measurement technique. We find a thermal conductivity of 0.24 Wm-1K-1 and an anisotropy ratio of 9.7. This work demonstrates that nanostencils can be used for scalable, resist-free patterning of nanoscale features on sensitive substrates.

Original languageEnglish (US)
Title of host publication2018 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2018
EditorsTina Lamers, Mina Rais-Zadeh
PublisherTransducer Research Foundation
Pages280-283
Number of pages4
ISBN (Electronic)9781940470030
DOIs
StatePublished - 2018
Externally publishedYes
Event2018 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2018 - Hilton Head, United States
Duration: Jun 3 2018Jun 7 2018

Publication series

Name2018 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2018

Conference

Conference2018 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2018
Country/TerritoryUnited States
CityHilton Head
Period6/3/186/7/18

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Hardware and Architecture

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