Nanoscale negative-tone quantized patterning by novel selective electrochemical etching of a nanoimprinted sub-200 nm bimetallic tilearray

Wen Di Li, Xiaogan Liang, Stephen Y. Chou

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

Quantum lithography (QL) is a revolutionary approach to significantly increase the throughput and lower the cost of electron beam lithography in writing large-area masks with nanoscale features. A major challenge in QL is that its principle can be readily applied to positive- but not negative-tone QL. In fact, negative-tone QL, which is as indispensable as positive-tone QL in practical usage, has not been achieved. Here we propose a new method to overcome the obstacle, and report the first experimental demonstration of negative-tone QL. The new method uses a new type of nanoimprinted blank with the nanoscale tiles made of an aluminum/chromium bi-layer of metals, and a novel electrochemical process that removes only non-tagged quantized tiles of the new blank while keeping tagged ones. The demonstrated negative-tone QL has a 200nm pitch and 30nm gap and can be further scaled down to even smaller pitch sizes.

Original languageEnglish (US)
Article number355303
JournalNanotechnology
Volume23
Issue number35
DOIs
StatePublished - Sep 7 2012

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Nanoscale negative-tone quantized patterning by novel selective electrochemical etching of a nanoimprinted sub-200 nm bimetallic tilearray'. Together they form a unique fingerprint.

  • Cite this