Nanoscale and micrometer-scale GaAs metal-semiconductor-metal photodetectors (MSM-PD) are fabricated and characterized using nanoimprint technology (NIL). MSM-PDs fabricated with NIL are compared with MSM-PDs prepared with electron beam lithography and photolithography. The effects of imprinting conditions on MSM-PD characteristics are analyzed.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)