Abstract
Here we demonstrate for the first time massively parallelizable nanoplasmonic structures exploiting the subwavelength lithography of embedded copper-based interconnect layers in an industry standard CMOS process with 65-nm feature size. We show this in the context of a fully integrated, fluorescence based CMOS bio-molecular sensor array with integrated angle and scattering insensitive nanoplasmonic filters. The nano-optics and the all the readout analog and digital electronics are all co-designed and co-integrated in a single 2 mm2 CMOS chip with absolutely ‘no change’ approach to the CMOS foundry processes.
Original language | English (US) |
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Pages (from-to) | 266 |
Number of pages | 1 |
Journal | International Conference on Metamaterials, Photonic Crystals and Plasmonics |
State | Published - 2019 |
Externally published | Yes |
Event | 10th International Conference on Metamaterials, Photonic Crystals and Plasmonics, META 2019 - Lisbon, Portugal Duration: Jul 23 2019 → Jul 26 2019 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
- Materials Science (miscellaneous)
- Electronic, Optical and Magnetic Materials
- Materials Chemistry