Nanoimprint mold fabrication and replication by room-temperature conformal chemical vapor deposition

Patrick F. Murphy, Keith J. Morton, Zengli Fu, Stephen Y. Chou

Research output: Contribution to journalArticle

17 Scopus citations

Abstract

The authors present a technique for the replication of molds for nanoimprint lithography (NIL) without solvents or etching. A thin hard amorphous silicon film is deposited onto imprinted or self-assembled polymer nanostructures by room-temperature conformal plasma-enhanced chemical vapor deposition. After attachment to another substrate and separation from the polymer original, the thin hard film forms a NIL mold that is the inverse of the polymer original. Using this technology, the authors demonstrate the replication of a 200 nm pitch grating mold and sub- 50-nm features over wafer-scale areas without introducing additional line edge roughness associated with conventional replication methods.

Original languageEnglish (US)
Article number203115
JournalApplied Physics Letters
Volume90
Issue number20
DOIs
StatePublished - May 28 2007

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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