@article{b0d32f591210477daa98ca2932a7a087,
title = "Nanoimprint lithography and lithographically induced self-assembly",
author = "Chou, {Stephen Y.}",
note = "Funding Information: It is my great pleasure to thank many previous and present members of my group for their contributions to NIL and LISA and the highlights reviewed here, in particular, P.R. Krauss, P.J. Renstrom, L. Guo, L. Zhuang, W. Zhang, W. Wu, L. Chen, Y. Zhaoning, Mingtao Li, Jian Wang, H. Tan, Paru Deshpande, L. He, B. Cui, X.Y. Sun, S.J. Schablitsky, and A. Gilbertson. The work is supported in part by the U.S. Defense Advanced Research Projects Agency (DARPA), the Of- fice of Naval Research (ONR), the Army Research Office (ARO), and the Air Force Office of Scientific Research (AFOSR).",
year = "2001",
month = jul,
doi = "10.1557/mrs2001.122",
language = "English (US)",
volume = "26",
pages = "512--517",
journal = "MRS Bulletin",
issn = "0883-7694",
publisher = "Materials Research Society",
number = "7",
}