Nanoimprint lithography - A key "engine" to nanotechnology research and commercialization today

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Nanoimprint lithography (NIL) has increasingly been recognized as a key nanomanufacturing technology that will play a critical role in commercialization of nanostructures. In this talk, we will overview the development of NIL technologies (machines, masks, resists, and processes) and applications in the NanoStructure Laboratory at Princeton University.

Original languageEnglish (US)
Title of host publication2002 International Microprocesses and Nanotechnology Conference, MNC 2002
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)4891140313, 9784891140311
DOIs
StatePublished - Jan 1 2002
EventInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
Duration: Nov 6 2002Nov 8 2002

Publication series

Name2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
CountryJapan
CityTokyo
Period11/6/0211/8/02

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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