Abstract
Due to its demonstrated ultrahigh patterning resolution and throughput, nanoimprint has been put on the roadmaps of many industries, including International Technology Roadmap for Semiconductors (ITRS) as a next-generation patterning method for manufacturing semiconductor-integrated circuits and the roadmap for manufacturing magnetic data storage disks.
| Original language | English (US) |
|---|---|
| Title of host publication | Nanofabrication Handbook |
| Publisher | CRC Press |
| Pages | 187-206 |
| Number of pages | 20 |
| ISBN (Electronic) | 9781420090536 |
| ISBN (Print) | 9781420090529 |
| DOIs | |
| State | Published - Jan 1 2012 |
All Science Journal Classification (ASJC) codes
- General Engineering
- General Materials Science
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