Abstract
Due to its demonstrated ultrahigh patterning resolution and throughput, nanoimprint has been put on the roadmaps of many industries, including International Technology Roadmap for Semiconductors (ITRS) as a next-generation patterning method for manufacturing semiconductor-integrated circuits and the roadmap for manufacturing magnetic data storage disks.
Original language | English (US) |
---|---|
Title of host publication | Nanofabrication Handbook |
Publisher | CRC Press |
Pages | 187-206 |
Number of pages | 20 |
ISBN (Electronic) | 9781420090536 |
ISBN (Print) | 9781420090529 |
DOIs | |
State | Published - Jan 1 2012 |
All Science Journal Classification (ASJC) codes
- General Engineering
- General Materials Science