Nanoimprint lithography

Research output: Chapter in Book/Report/Conference proceedingChapter

6 Scopus citations

Abstract

Due to its demonstrated ultrahigh patterning resolution and throughput, nanoimprint has been put on the roadmaps of many industries, including International Technology Roadmap for Semiconductors (ITRS) as a next-generation patterning method for manufacturing semiconductor-integrated circuits and the roadmap for manufacturing magnetic data storage disks.

Original languageEnglish (US)
Title of host publicationNanofabrication Handbook
PublisherCRC Press
Pages187-206
Number of pages20
ISBN (Electronic)9781420090536
ISBN (Print)9781420090529
DOIs
StatePublished - Jan 1 2012

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Materials Science(all)

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