Nanoimprint lithography

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom

Research output: Contribution to journalArticle

1592 Scopus citations

Abstract

Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners: Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be sub-10 nm, the imprint process is repeatable, and the mold is durable. In addition, uniformity over a 15 mm by 18 mm area was demonstrated and the uniformity area can be much larger if a better designed press is used. Nanoimprint lithography over a nonflat surface has also been achieved. Finally, nanoimprint lithography has been successfully used for fabricating nanoscale photodetectors, silicon quantum-dot, quantum-wire, and ring transistors.

Original languageEnglish (US)
Pages (from-to)4129-4133
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume14
Issue number6
DOIs
StatePublished - Jan 1 1996
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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