Multilayer resist methods for nanoimprint lithography on nonflat surfaces

Xiaoyun Sun, Lei Zhuang, Wei Zhang, Stephen Y. Chou

Research output: Contribution to journalArticle

76 Scopus citations

Abstract

Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO2 surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces.

Original languageEnglish (US)
Pages (from-to)3922-3925
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume16
Issue number6
StatePublished - Nov 1 1998

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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