Multilayer resist methods for nanoimprint lithography on nonflat surfaces

Xiaoyun Sun; Lei Zhuang; Wei Zhang; Stephen Y. Chou

doi:10.1116/1.590437

Multilayer resist methods for nanoimprint lithography on nonflat surfaces

Xiaoyun Sun, Lei Zhuang, Wei Zhang, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

80 Scopus citations

Abstract

Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO₂ surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces.

Original language	English (US)
Pages (from-to)	3922-3925
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	16
Issue number	6
DOIs	https://doi.org/10.1116/1.590437
State	Published - 1998

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.590437

Cite this

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title = "Multilayer resist methods for nanoimprint lithography on nonflat surfaces",

abstract = "Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO2 surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces.",

author = "Xiaoyun Sun and Lei Zhuang and Wei Zhang and Chou, {Stephen Y.}",

year = "1998",

doi = "10.1116/1.590437",

language = "English (US)",

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pages = "3922--3925",

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AU - Sun, Xiaoyun

AU - Zhuang, Lei

AU - Zhang, Wei

AU - Chou, Stephen Y.

PY - 1998

Y1 - 1998

N2 - Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO2 surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces.

AB - Five multilayer resist methods (three positive tones and two negative tones) have been devised for nanoimprint lithography on nonflat surfaces. Three of the methods have been demonstrated experimentally on a SiO2 surface with 100 nm deep sharp steps. The advantages and disadvantages of each method are discussed. Our results should be applicable to nanoimprint lithography with 10 nm feature size on nonflat surfaces.

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JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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ER -

Multilayer resist methods for nanoimprint lithography on nonflat surfaces

Abstract

All Science Journal Classification (ASJC) codes

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