Multilayer graphene films grown by molecular beam deposition

Jorge M. Garcia, Rui He, Mason P. Jiang, Jun Yan, Aron Pinczuk, Yuri M. Zuev, Keun Soo Kim, Philip Kim, Kirk Baldwin, Ken W. West, Loren N. Pfeiffer

Research output: Contribution to journalArticlepeer-review

35 Scopus citations


Few-layer graphene films are grown using a Molecular Beam Deposition (MBD) technique in ultra-high vacuum by evaporation of atomic carbon and subsequent annealing of the samples at 800-900 °C. The graded thickness layers are grown on strip-shaped oxidized silicon substrates which are covered with 300 nm thick nickel films deposited by e-beam evaporation. The thickness of the deposited carbon layers changes continuously from ∼70 Å to less than 4 Å. The relatively narrow optical phonon bands in Raman spectroscopy reveal that good quality multilayer graphene films form on the Ni surface.

Original languageEnglish (US)
Pages (from-to)809-811
Number of pages3
JournalSolid State Communications
Issue number17-18
StatePublished - May 2010
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • Materials Chemistry


  • A. Graphene
  • B. Crystal growth
  • E. Inelastic light scattering


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