Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers

Jennifer H. Chu; Pratima Rangarajan; J. La Monte Adams; Richard A. Register

doi:10.1016/0032-3861(95)99001-B

Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers

Jennifer H. Chu, Pratima Rangarajan, J. La Monte Adams, Richard A. Register

Research output: Contribution to journal › Article › peer-review

58 Scopus citations

Abstract

Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separated in toluene-cast films, and estimates of the interaction parameter χ indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.

Original language	English (US)
Pages (from-to)	1569-1575
Number of pages	7
Journal	Polymer
Volume	36
Issue number	8
DOIs	https://doi.org/10.1016/0032-3861(95)99001-B
State	Published - 1995

All Science Journal Classification (ASJC) codes

Organic Chemistry
Polymers and Plastics
Materials Chemistry

Keywords

diblock copolymer
poly(dimethylsiloxane)
polystyrene

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10.1016/0032-3861(95)99001-B

Cite this

@article{af02bf9e025745e5b07a55bd168ef341,

title = "Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers",

abstract = "Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separated in toluene-cast films, and estimates of the interaction parameter χ indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.",

keywords = "diblock copolymer, poly(dimethylsiloxane), polystyrene",

author = "Chu, {Jennifer H.} and Pratima Rangarajan and Adams, {J. La Monte} and Register, {Richard A.}",

note = "Funding Information: Support for this work was provided by Hoechst-Celanese Corporation, and by the National Science Foundation, Polymers Program (DMR-9257565) and Materials Research Group (DMR-9223966). The assistance of Joseph Goodhouse and Nan Yao (Princeton University) in preparing and examining sample 59 by TEM is gratefully acknowledged.",

year = "1995",

doi = "10.1016/0032-3861(95)99001-B",

language = "English (US)",

volume = "36",

pages = "1569--1575",

journal = "Polymer",

issn = "0032-3861",

publisher = "Elsevier BV",

number = "8",

}

TY - JOUR

T1 - Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers

AU - Chu, Jennifer H.

AU - Rangarajan, Pratima

AU - Adams, J. La Monte

AU - Register, Richard A.

N1 - Funding Information: Support for this work was provided by Hoechst-Celanese Corporation, and by the National Science Foundation, Polymers Program (DMR-9257565) and Materials Research Group (DMR-9223966). The assistance of Joseph Goodhouse and Nan Yao (Princeton University) in preparing and examining sample 59 by TEM is gratefully acknowledged.

PY - 1995

Y1 - 1995

N2 - Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separated in toluene-cast films, and estimates of the interaction parameter χ indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.

AB - Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separated in toluene-cast films, and estimates of the interaction parameter χ indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.

KW - diblock copolymer

KW - poly(dimethylsiloxane)

KW - polystyrene

UR - http://www.scopus.com/inward/record.url?scp=0029288779&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029288779&partnerID=8YFLogxK

U2 - 10.1016/0032-3861(95)99001-B

DO - 10.1016/0032-3861(95)99001-B

M3 - Article

AN - SCOPUS:0029288779

SN - 0032-3861

VL - 36

SP - 1569

EP - 1575

JO - Polymer

JF - Polymer

IS - 8

ER -

Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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