Morphologies of strongly segregated polystyrene-poly(dimethylsiloxane) diblock copolymers

Jennifer H. Chu, Pratima Rangarajan, J. La Monte Adams, Richard A. Register

Research output: Contribution to journalArticle

50 Scopus citations

Abstract

Five polystyrene-poly(dimethylsiloxane) (PS/PDMS) diblocks were synthesized by sequential anionic polymerization, and their morphologies characterized by small-angle X-ray scattering (SAXS) and transmission electron microscopy (TEM). All materials are microphase-separated in toluene-cast films, and estimates of the interaction parameter χ indicate that these materials are all strongly segregated. The experimentally determined phase diagram is strongly skewed towards low styrene volume fractions, even more than the styrene-isoprene (SI) diblock phase diagram, even though little conformational asymmetry should exist in the PS/PDMS system. The PS/PDMS diblocks form substantially larger microdomain structures than the analogous SI diblocks, reflecting the stronger segregation strength.

Original languageEnglish (US)
Pages (from-to)1569-1575
Number of pages7
JournalPolymer
Volume36
Issue number8
DOIs
StatePublished - 1995

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

Keywords

  • diblock copolymer
  • poly(dimethylsiloxane)
  • polystyrene

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