Molecular dynamics simulations of plasma-surface interactions: Nanoscale feature etching on a silicon substrate

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	AIChE100 - 2008 AIChE Annual Meeting, Conference Proceedings
State	Published - 2008
Externally published	Yes
Event	2008 AIChE Annual Meeting, AIChE 100 - Philadelphia, PA, United States Duration: Nov 16 2008 → Nov 21 2008

Name	AIChE Annual Meeting, Conference Proceedings

All Science Journal Classification (ASJC) codes

@inproceedings{71f2b6114313497b958cb15e798c7a7e,

title = "Molecular dynamics simulations of plasma-surface interactions: Nanoscale feature etching on a silicon substrate",

author = "V{\'e}gh, {Joseph J.} and Graves, {David B.}",

year = "2008",

language = "English (US)",

isbn = "9780816910502",

series = "AIChE Annual Meeting, Conference Proceedings",

booktitle = "AIChE100 - 2008 AIChE Annual Meeting, Conference Proceedings",

note = "2008 AIChE Annual Meeting, AIChE 100 ; Conference date: 16-11-2008 Through 21-11-2008",

}

TY - GEN

T1 - Molecular dynamics simulations of plasma-surface interactions

T2 - 2008 AIChE Annual Meeting, AIChE 100

AU - Végh, Joseph J.

AU - Graves, David B.

PY - 2008

Y1 - 2008

UR - http://www.scopus.com/inward/record.url?scp=79952287437&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79952287437&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:79952287437

SN - 9780816910502

T3 - AIChE Annual Meeting, Conference Proceedings

BT - AIChE100 - 2008 AIChE Annual Meeting, Conference Proceedings

Y2 - 16 November 2008 through 21 November 2008

ER -