Modeling of high density plasma sources

David B. Graves; Han Ming Wu; Robert K. Porteous

doi:10.1117/12.142912

Modeling of high density plasma sources

David B. Graves, Han Ming Wu, Robert K. Porteous

Research output: Contribution to journal › Conference article › peer-review

Abstract

A two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.

Original language	English (US)
Pages (from-to)	160-171
Number of pages	12
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	1803
DOIs	https://doi.org/10.1117/12.142912
State	Published - Apr 16 1993
Externally published	Yes
Event	Advanced Techniques for Integrated Circuit Processing II 1992 - San Jose, United States Duration: Sep 20 1992 → Sep 25 1992

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.142912

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title = "Modeling of high density plasma sources",

abstract = "A two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.",

author = "Graves, {David B.} and Wu, {Han Ming} and Porteous, {Robert K.}",

note = "Funding Information: This work was supported, in part, by the National Science Foundation Grant No. Cf S-8957 179. Publisher Copyright: {\textcopyright} 1993 SPIE. All rights reserved.; Advanced Techniques for Integrated Circuit Processing II 1992 ; Conference date: 20-09-1992 Through 25-09-1992",

year = "1993",

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doi = "10.1117/12.142912",

language = "English (US)",

volume = "1803",

pages = "160--171",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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TY - JOUR

T1 - Modeling of high density plasma sources

AU - Graves, David B.

AU - Wu, Han Ming

AU - Porteous, Robert K.

PY - 1993/4/16

Y1 - 1993/4/16

N2 - A two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.

AB - A two-dimensional, axisymmetric model of a bounded, partially ionized, magnetized glow discharge plasma is presented. The model treats positive ions as particles and electrons as a fluid in a hybrid configuration. The results reported here are directed towards simulating an electron cyclotron resonance (ECR), microwave-sustained plasma. Results include predictions of plasma density and potential, electron temperature and ion flux and energy. Models such as the one presented here have the potential to be used by plasma process engineers and plasma tool designers.

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U2 - 10.1117/12.142912

DO - 10.1117/12.142912

M3 - Conference article

AN - SCOPUS:85075780421

SN - 0277-786X

VL - 1803

SP - 160

EP - 171

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Advanced Techniques for Integrated Circuit Processing II 1992

Y2 - 20 September 1992 through 25 September 1992

ER -

Modeling of high density plasma sources

Abstract

All Science Journal Classification (ASJC) codes

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