Modeling and simulation of high density plasmas

David B. Graves, Hanming Wu, Robert K. Porteous

Research output: Contribution to journalArticlepeer-review

35 Scopus citations


We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

Original languageEnglish (US)
Pages (from-to)2999-3006
Number of pages8
JournalJapanese Journal of Applied Physics
Issue number6 S
StatePublished - Jun 1993
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Engineering
  • General Physics and Astronomy


  • Electron cyclotron resonance
  • High density plasma sources
  • Plasma simulation


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