Modeling and simulation of high density plasmas

David B. Graves; Hanming Wu; Robert K. Porteous

doi:10.1143/JJAP.32.2999

Modeling and simulation of high density plasmas

David B. Graves, Hanming Wu, Robert K. Porteous

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

Original language	English (US)
Pages (from-to)	2999-3006
Number of pages	8
Journal	Japanese Journal of Applied Physics
Volume	32
Issue number	6 S
DOIs	https://doi.org/10.1143/JJAP.32.2999
State	Published - Jun 1993
Externally published	Yes

All Science Journal Classification (ASJC) codes

Engineering(all)
Physics and Astronomy(all)

Keywords

Electron cyclotron resonance
High density plasma sources
Plasma simulation

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10.1143/JJAP.32.2999

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abstract = "We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.",

keywords = "Electron cyclotron resonance, High density plasma sources, Plasma simulation",

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year = "1993",

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journal = "Japanese Journal of Applied Physics",

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T1 - Modeling and simulation of high density plasmas

AU - Graves, David B.

AU - Wu, Hanming

AU - Porteous, Robert K.

PY - 1993/6

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N2 - We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

AB - We present a model of an ECR plasma in a cylindrical (z, r) geometry with resonant zone near the substrate surface. The model combines a hybrid (particle ion-fluid electron) treatment of plasma transport with an ad-hoc model of microwave power deposition. The model is used to test the effect of the radial profile of microwave power on the spatial profiles of plasma parameters: plasma density, plasma potential and electron temperature. It is shown that for uniformity of ion flux at the substrate surface, microwave power must be peaked off axis.

KW - Electron cyclotron resonance

KW - High density plasma sources

KW - Plasma simulation

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EP - 3006

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 6 S

ER -

Modeling and simulation of high density plasmas

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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