Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma

Ales Fiala; Mark Kiehlbauch; Sergej Mahnovski; David B. Graves

doi:10.1063/1.370711

Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma

Ales Fiala, Mark Kiehlbauch, Sergej Mahnovski, David B. Graves

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

A model of the coupled plasma and neutral reacting flow for a C₂F₆/O₂ plasma is presented. The high density plasma strongly perturbs the neutral gas flowing through it, creating high concentrations of radicals that react to form products. The basic operation of the fluorocarbon/oxygen point-of-use plasma abatement (PPA) plasma is summarized.

Original language	English (US)
Pages (from-to)	152-162
Number of pages	11
Journal	Journal of Applied Physics
Volume	86
Issue number	1
DOIs	https://doi.org/10.1063/1.370711
State	Published - Jul 1999
Externally published	Yes

All Science Journal Classification (ASJC) codes

General Physics and Astronomy

Access to Document

10.1063/1.370711

Cite this

@article{6d037b43fadf4cbdb590678dbaa5e80e,

title = "Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma",

abstract = "A model of the coupled plasma and neutral reacting flow for a C2F6/O2 plasma is presented. The high density plasma strongly perturbs the neutral gas flowing through it, creating high concentrations of radicals that react to form products. The basic operation of the fluorocarbon/oxygen point-of-use plasma abatement (PPA) plasma is summarized.",

author = "Ales Fiala and Mark Kiehlbauch and Sergej Mahnovski and Graves, {David B.}",

year = "1999",

month = jul,

doi = "10.1063/1.370711",

language = "English (US)",

volume = "86",

pages = "152--162",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "1",

}

TY - JOUR

T1 - Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma

AU - Fiala, Ales

AU - Kiehlbauch, Mark

AU - Mahnovski, Sergej

AU - Graves, David B.

PY - 1999/7

Y1 - 1999/7

N2 - A model of the coupled plasma and neutral reacting flow for a C2F6/O2 plasma is presented. The high density plasma strongly perturbs the neutral gas flowing through it, creating high concentrations of radicals that react to form products. The basic operation of the fluorocarbon/oxygen point-of-use plasma abatement (PPA) plasma is summarized.

AB - A model of the coupled plasma and neutral reacting flow for a C2F6/O2 plasma is presented. The high density plasma strongly perturbs the neutral gas flowing through it, creating high concentrations of radicals that react to form products. The basic operation of the fluorocarbon/oxygen point-of-use plasma abatement (PPA) plasma is summarized.

UR - http://www.scopus.com/inward/record.url?scp=0032607024&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032607024&partnerID=8YFLogxK

U2 - 10.1063/1.370711

DO - 10.1063/1.370711

M3 - Article

AN - SCOPUS:0032607024

SN - 0021-8979

VL - 86

SP - 152

EP - 162

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -

Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma

Abstract

All Science Journal Classification (ASJC) codes

Access to Document

Other files and links

Fingerprint

Cite this