Microstructural studies of Co silicide layers formed on SiGe and SiGeC

  • S. Jin
  • , H. Bender
  • , R. A. Donaton
  • , K. Maex
  • , A. Vantomme
  • , G. Langouche
  • , A. St Amour
  • , J. C. Sturm

Research output: Contribution to journalConference articlepeer-review

Abstract

Transmission electron microscopy is used to investigate the structural development as a function of the annealing temperature of Co-silicides prepared on SiGe and SiGeC. The transition temperature from Co(SiGe) into Co(SiGe)2 is higher for SiGeC than for SiGe.

Original languageEnglish (US)
Pages (from-to)359-364
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume448
StatePublished - 1997
Externally publishedYes
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: Dec 2 1996Dec 4 1996

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • General Materials Science

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