The micron scale patterned growth of small molecular weight organic semiconductor thin films was presented. The micropatterning was done by the use of organic vapor phase deposition (OVPD). The simulation and deposition experiments showed that the deposited feature shape was controlled by the mean free path, the aperture geometry and the mask-to-substrate separation.
|Original language||English (US)|
|Number of pages||12|
|Journal||Journal of Applied Physics|
|State||Published - Apr 1 2003|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)