Metal-insulator-semiconductor (MIS) photoelectrodes: Distance improves performance

Joshua Jack; Zhiyong Jason Ren

doi:10.1093/nsr/nwab089

Metal-insulator-semiconductor (MIS) photoelectrodes: Distance improves performance

Joshua Jack
, Zhiyong Jason Ren

Research output: Contribution to journal › Short survey › peer-review

Original language	English (US)
Article number	nwab089
Journal	National Science Review
Volume	8
Issue number	8
DOIs	https://doi.org/10.1093/nsr/nwab089
State	Published - Aug 1 2021

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10.1093/nsr/nwab089

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@article{302cd8efd21345e9b0d6a7afc9c9986d,

title = "Metal-insulator-semiconductor (MIS) photoelectrodes: Distance improves performance",

author = "Joshua Jack and Ren, \{Zhiyong Jason\}",

year = "2021",

month = aug,

day = "1",

doi = "10.1093/nsr/nwab089",

language = "English (US)",

volume = "8",

journal = "National Science Review",

issn = "2095-5138",

publisher = "Oxford University Press",

number = "8",

}

TY - JOUR

T1 - Metal-insulator-semiconductor (MIS) photoelectrodes

T2 - Distance improves performance

AU - Jack, Joshua

AU - Ren, Zhiyong Jason

PY - 2021/8/1

Y1 - 2021/8/1

UR - https://www.scopus.com/pages/publications/85114182815

UR - https://www.scopus.com/pages/publications/85114182815#tab=citedBy

U2 - 10.1093/nsr/nwab089

DO - 10.1093/nsr/nwab089

M3 - Short survey

C2 - 34691716

AN - SCOPUS:85114182815

SN - 2095-5138

VL - 8

JO - National Science Review

JF - National Science Review

IS - 8

M1 - nwab089

ER -

Metal-insulator-semiconductor (MIS) photoelectrodes: Distance improves performance

All Science Journal Classification (ASJC) codes

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