Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio

So Youn Kim, Jessica Gwyther, Ian Manners, Paul M. Chaikin, Richard A. Register

Research output: Contribution to journalArticlepeer-review

36 Scopus citations

Abstract

Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.

Original languageEnglish (US)
Pages (from-to)791-795
Number of pages5
JournalAdvanced Materials
Volume26
Issue number5
DOIs
StatePublished - Feb 5 2014

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Keywords

  • block copolymer lithography
  • nanopatterning
  • wire grid polarizer

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