Mechanistic Predictions for Fluorine Etching of Si(100)

Engineering & Materials Science

• Fluorine 97%
• Etching 76%
• Atoms 73%
• Dangling bonds 32%
• Silicon 27%
• Electronic structure 26%
• Exothermic reactions 24%
• Monolayers 23%
• Adsorption 17%
• Hot Temperature 17%
• Chemical activation 15%
• Experiments 6%

Chemical Compounds

• Etching 63%
• Fluorine Atom 62%
• Dangling Bond 23%
• Monolayer 13%
• Heat 13%
• Electronic State 13%
• Molecular Cluster 11%
• Adsorption 8%
• Surface 5%

Medicine & Life Sciences

• Fluorine 100%
• Silicon 43%
• Hot Temperature 27%
• Adsorption 19%