TY - JOUR
T1 - Matching an RF Sheath Model to a Bulk Plasma Model
AU - Nitschke, Timothy E.
AU - Graves, David B.
N1 - Funding Information:
Manuscript received September 21, 1994; revised January 5, 1995. This work was supported in part by the National Science Foundation under Grant CTS8957179; in part by the Intel Corporation, and the California state MICRO program The authors are with the Department of Chemical Engineering, University of California, Berkeley, CA 94720 USA. IEEE Log Number 9412962.
PY - 1995/8
Y1 - 1995/8
N2 - In this paper, we present a combined plasma-sheath model designed for the study of high density discharges, or other systems with thin sheaths. Sheaths in high density plasmas are typically less than 1 mm in thickness. When modeling multidimensional discharges, fully resolving the sheaths can be prohibitively expensive computationally, especially when RF power is coupled capacitively into the discharge. However, the sheath impedance often strongly affects instantaneous and period-averaged plasma potentials, which in turn can strongly influence crucial processing characteristics such as the ion energy and angular distributions impacting surfaces. In the combined plasma-sheath model we present, the sheaths are treated independently from the plasma region, and different length scales are employed for each. The Godyak-Sternberg sheath model [Phys. Rev. A, 42, 2299 (1990)] is used to represent the sheaths. The bulk plasma portion of the discharge is represented using a fluid model. Boundary conditions at the plasma-sheath interfaces transfer information dynamically between the sheath and bulk plasma portions of the model. Results from the combined plasma-sheath model are compared to results from a discharge model that fully resolves the sheaths, with generally good to excellent agreement.
AB - In this paper, we present a combined plasma-sheath model designed for the study of high density discharges, or other systems with thin sheaths. Sheaths in high density plasmas are typically less than 1 mm in thickness. When modeling multidimensional discharges, fully resolving the sheaths can be prohibitively expensive computationally, especially when RF power is coupled capacitively into the discharge. However, the sheath impedance often strongly affects instantaneous and period-averaged plasma potentials, which in turn can strongly influence crucial processing characteristics such as the ion energy and angular distributions impacting surfaces. In the combined plasma-sheath model we present, the sheaths are treated independently from the plasma region, and different length scales are employed for each. The Godyak-Sternberg sheath model [Phys. Rev. A, 42, 2299 (1990)] is used to represent the sheaths. The bulk plasma portion of the discharge is represented using a fluid model. Boundary conditions at the plasma-sheath interfaces transfer information dynamically between the sheath and bulk plasma portions of the model. Results from the combined plasma-sheath model are compared to results from a discharge model that fully resolves the sheaths, with generally good to excellent agreement.
UR - http://www.scopus.com/inward/record.url?scp=0029352781&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0029352781&partnerID=8YFLogxK
U2 - 10.1109/27.467994
DO - 10.1109/27.467994
M3 - Article
AN - SCOPUS:0029352781
SN - 0093-3813
VL - 23
SP - 717
EP - 727
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 4
ER -