TY - JOUR
T1 - Lithographically induced self-construction of polymer microstructures for resistless patterning
AU - Chou, Stephen Y.
AU - Zhuang, Lei
AU - Guo, Linjie
PY - 1999/8/16
Y1 - 1999/8/16
N2 - We have discovered and developed a method that can directly pattern polymer microstructures of arbitrary shapes without using a resist, exposure, chemical development, and etching. A mask with protruded patterns is placed a distance above an initially flat polymer film cast on a substrate. During a heating cycle that raises the temperature above the polymer's glass transition temperature and then cooled back to the room temperature, we found that the polymer was attracted to the mask protrusions on their own, forming the mesas that have a lateral dimension identical to that of the mask protrusions, a height equal to the distance between the mask and the substrate, and a relatively steep sidewall. The method, termed lithographically induced self-construction, is important to the fabrication of polymer electronic and optoelectronic devices.
AB - We have discovered and developed a method that can directly pattern polymer microstructures of arbitrary shapes without using a resist, exposure, chemical development, and etching. A mask with protruded patterns is placed a distance above an initially flat polymer film cast on a substrate. During a heating cycle that raises the temperature above the polymer's glass transition temperature and then cooled back to the room temperature, we found that the polymer was attracted to the mask protrusions on their own, forming the mesas that have a lateral dimension identical to that of the mask protrusions, a height equal to the distance between the mask and the substrate, and a relatively steep sidewall. The method, termed lithographically induced self-construction, is important to the fabrication of polymer electronic and optoelectronic devices.
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U2 - 10.1063/1.124579
DO - 10.1063/1.124579
M3 - Article
AN - SCOPUS:0001577714
SN - 0003-6951
VL - 75
SP - 1004
EP - 1006
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 7
ER -