Layout and material gradation in topology optimization of functionally graded structures: A global-local approach

Sylvia R.M. Almeida, Glaucio H. Paulino, Emilio C.N. Silva

Research output: Contribution to journalArticlepeer-review

53 Scopus citations

Abstract

By means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials.

Original languageEnglish (US)
Pages (from-to)855-868
Number of pages14
JournalStructural and Multidisciplinary Optimization
Volume42
Issue number6
DOIs
StatePublished - Dec 2010
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Software
  • Control and Systems Engineering
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design
  • Control and Optimization

Keywords

  • Functionally graded materials
  • Functionally graded structures
  • Material gradation
  • Material layout
  • Symmetry and pattern repetition constraints
  • Topology optimization

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