Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

Josee Vedrine; Young Rae Hong; Andrew P. Marencic; Richard A. Register; Douglas H. Adamson; Paul M. Chaikin

doi:10.1063/1.2794010

Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

Josee Vedrine, Young Rae Hong, Andrew P. Marencic, Richard A. Register, Douglas H. Adamson, Paul M. Chaikin

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

Original language	English (US)
Article number	143110
Journal	Applied Physics Letters
Volume	91
Issue number	14
DOIs	https://doi.org/10.1063/1.2794010
State	Published - 2007

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2794010

Cite this

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title = "Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates",

abstract = "Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.",

author = "Josee Vedrine and Hong, {Young Rae} and Marencic, {Andrew P.} and Register, {Richard A.} and Adamson, {Douglas H.} and Chaikin, {Paul M.}",

note = "Funding Information: The authors would like to thank Thomas Pickthorn (Oxford University) for the technical assistance. This work was supported by the National Science Foundation (MRSEC Program) through the Princeton Center for Complex Materials (DMR-0213706) and by a Princeton School of Engineering and Applied Science Fellowship to J.V. ",

year = "2007",

doi = "10.1063/1.2794010",

language = "English (US)",

volume = "91",

journal = "Applied Physics Letters",

issn = "0003-6951",

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T1 - Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

AU - Vedrine, Josee

AU - Hong, Young Rae

AU - Marencic, Andrew P.

AU - Register, Richard A.

AU - Adamson, Douglas H.

AU - Chaikin, Paul M.

N1 - Funding Information: The authors would like to thank Thomas Pickthorn (Oxford University) for the technical assistance. This work was supported by the National Science Foundation (MRSEC Program) through the Princeton Center for Complex Materials (DMR-0213706) and by a Princeton School of Engineering and Applied Science Fellowship to J.V.

PY - 2007

Y1 - 2007

N2 - Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

AB - Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

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Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

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