Large-area nanosquare arrays from shear-aligned block copolymer thin films

So Youn Kim, Adam Nunns, Jessica Gwyther, Raleigh L. Davis, Ian Manners, Paul M. Chaikin, Richard A. Register

Research output: Contribution to journalArticle

46 Scopus citations

Abstract

While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

Original languageEnglish (US)
Pages (from-to)5698-5705
Number of pages8
JournalNano Letters
Volume14
Issue number10
DOIs
StatePublished - Oct 8 2014

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Keywords

  • Block copolymer lithography
  • metal dots
  • nanopatterning
  • square arrays

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    Kim, S. Y., Nunns, A., Gwyther, J., Davis, R. L., Manners, I., Chaikin, P. M., & Register, R. A. (2014). Large-area nanosquare arrays from shear-aligned block copolymer thin films. Nano Letters, 14(10), 5698-5705. https://doi.org/10.1021/nl502416b