Abstract
While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.
Original language | English (US) |
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Pages (from-to) | 5698-5705 |
Number of pages | 8 |
Journal | Nano Letters |
Volume | 14 |
Issue number | 10 |
DOIs | |
State | Published - Oct 8 2014 |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Condensed Matter Physics
- Mechanical Engineering
- Bioengineering
- General Materials Science
Keywords
- Block copolymer lithography
- metal dots
- nanopatterning
- square arrays