@inproceedings{cad4220d57b74c2db8fa81f43d517409,
title = "Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography",
abstract = "For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength.",
author = "Li, {Wen Di} and Chou, {Stephen Y.}",
year = "2007",
language = "English (US)",
isbn = "1557528349",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America",
booktitle = "Conference on Lasers and Electro-Optics, CLEO 2007",
note = "Conference on Lasers and Electro-Optics, CLEO 2007 ; Conference date: 06-05-2007 Through 06-05-2007",
}