@inproceedings{47cd7d7272a34fdfb450b32c18b743c4,
title = "Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography",
abstract = "For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength.",
author = "Li, {Wen Di} and Chou, {Stephen Y.}",
year = "2007",
doi = "10.1109/CLEO.2007.4452830",
language = "English (US)",
isbn = "9781557528346",
series = "Conference on Lasers and Electro-Optics, 2007, CLEO 2007",
booktitle = "Conference on Lasers and Electro-Optics, 2007, CLEO 2007",
note = "Conference on Lasers and Electro-Optics, 2007, CLEO 2007 ; Conference date: 06-05-2007 Through 11-05-2007",
}