Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography

Wen Di Li, Stephen Y. Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength.

Original languageEnglish (US)
Title of host publicationConference on Lasers and Electro-Optics, 2007, CLEO 2007
DOIs
StatePublished - Dec 1 2007
EventConference on Lasers and Electro-Optics, 2007, CLEO 2007 - Baltimore, MD, United States
Duration: May 6 2007May 11 2007

Publication series

NameConference on Lasers and Electro-Optics, 2007, CLEO 2007

Other

OtherConference on Lasers and Electro-Optics, 2007, CLEO 2007
CountryUnited States
CityBaltimore, MD
Period5/6/075/11/07

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Li, W. D., & Chou, S. Y. (2007). Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography. In Conference on Lasers and Electro-Optics, 2007, CLEO 2007 [4452830] (Conference on Lasers and Electro-Optics, 2007, CLEO 2007). https://doi.org/10.1109/CLEO.2007.4452830