Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications

Mingtao Li; Hua Tan; Lei Chen; Jian Wang; Stephen Y. Chou

Large area direct nanoimprinting of SiO₂-TiO₂ gel gratings for optical applications

Mingtao Li, Hua Tan, Lei Chen, Jian Wang, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

Abstract

Large area direct nanoimprinting of SiO₂-TiO₂ gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.

Original language	English (US)
Pages (from-to)	660-663
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	2
State	Published - Mar 2003

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

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title = "Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications",

abstract = "Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.",

author = "Mingtao Li and Hua Tan and Lei Chen and Jian Wang and Chou, \{Stephen Y.\}",

year = "2003",

month = mar,

language = "English (US)",

volume = "21",

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journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "American Institute of Physics",

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T1 - Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications

AU - Li, Mingtao

AU - Tan, Hua

AU - Chen, Lei

AU - Wang, Jian

AU - Chou, Stephen Y.

PY - 2003/3

Y1 - 2003/3

N2 - Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.

AB - Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.

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M3 - Article

AN - SCOPUS:0037276897

SN - 1071-1023

VL - 21

SP - 660

EP - 663

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 2

ER -

Large area direct nanoimprinting of SiO₂-TiO₂ gel gratings for optical applications

Abstract

All Science Journal Classification (ASJC) codes

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