Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.
|Original language||English (US)|
|Number of pages||4|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Mar 1 2003|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering