Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications

Mingtao Li, Hua Tan, Lei Chen, Jian Wang, Stephen Y. Chou

Research output: Contribution to journalArticle

88 Scopus citations

Abstract

Large area direct nanoimprinting of SiO2-TiO2 gel gratings for optical applications were investigated. An economical way of fabricating gel-film based devices by combining nanoimprint lithography (NIL) and a sol-gel technique was presented. Atomic force microscopy results of surface roughness measurements of waveguide gratings showed smooth profiles with root mean square roughness less than 6 nm.

Original languageEnglish (US)
Pages (from-to)660-663
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number2
StatePublished - Mar 1 2003

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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