Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling

Bo Cui, Zhaoning Yu, Haixiong Ge, Stephen Y. Chou

Research output: Contribution to journalArticle

25 Scopus citations

Abstract

The authors have developed an approach to fabricate large area 50 nm period gratings (22 nm linewidth) with low cost. The method used a fabrication cycle twice, each combining nanoimprint lithography with a spatial frequency doubling based on electroless plating, lift-off, and reactive ion etching. Hence by frequency doubling twice, we started with a 200 nm period grating mold and finished with a 50 nm period grating with a uniform area of 3 cm2 -the largest achieved today. This method is scalable for the fabrication of even smaller period gratings over a large area, and is a viable low-cost technique for making nanoimprint lithography molds for high-throughput fabrication of 50 nm period grating or grid devices.

Original languageEnglish (US)
Article number043118
JournalApplied Physics Letters
Volume90
Issue number4
DOIs
StatePublished - Feb 5 2007

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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