Kinetic study of low temperature oxidation of N-pentane with nitric oxide addition in a jet stirred reactor

Hao Zhao, Lingnan Wu, Charles Patrick, Zunhua Zhang, Yacine Rezgui, Gerard Wysocki, Yiguang Ju

Research output: Contribution to conferencePaperpeer-review

1 Scopus citations


The low temperature oxidation of n-pentane with nitric oxide (NO) addition from 400K to 800K has been investigated in an atmospheric jet stirred reactor (JSR). The concentration of NO is varied from 0 to 1070ppm in the mixture to study its sensitization effect on the n-pentane oxidation. n-pentane, O2, CO, CO2, CH2O, CH2O, C2H4, CH3CHO, H2O2, NO, and NO2 are in-situ quantified by using the molecular beam mass spectrometer (MBMS), micro-gas chromatography (µ-GC), and the transportable dual-modulation faraday rotation spectrometer (DM-FRS) simultaneously. The experimental results reveal that the presence of NO inhibits and promotes the oxidation of n-pentane at lower and higher temperatures, respectively, and has a significant effect on the oxidation initiation temperature and negative temperature coefficient (NTC) behavior of n-pentane. A new NO sensitized n-pentane mechanism, consists of a existing n-pentane base mechanism with an appropriate addition of our NOx sub-mechanism, is developed and refined to predict the experimental results. The key features of NO sensitized n-pentane oxidation are captured in the model and the kinetic effect of NO sensitization is detailed analyzed with varied temperatures.

Original languageEnglish (US)
StatePublished - 2017
Event10th U.S. National Combustion Meeting - College Park, United States
Duration: Apr 23 2017Apr 26 2017


Other10th U.S. National Combustion Meeting
Country/TerritoryUnited States
CityCollege Park

All Science Journal Classification (ASJC) codes

  • General Chemical Engineering
  • Physical and Theoretical Chemistry
  • Mechanical Engineering


  • Jet stirred reactor
  • Low temperature chemistry
  • NO sensitization
  • n-pentane oxidation


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