@inproceedings{470d5ec1831d45e68e931bbebd149360,
title = "Kinetic simulations of plasma dynamics in the EUV sources",
abstract = "Fast ion debris generated in laser-tin droplet interaction can pose severe threats to the lifetime of the collector mirror in EUV sources. In the present work, we conduct one-dimensional fully kinetic Particle-In-Cell simulations using PSC code that is capable of capturing fast ion debris formation. We discuss the progress in the implementation of physics modules for the PSC code that is required to reproduce the dynamics of the laser-produced plasmas in EUV sources. We demonstrate decent agreement between our kinetic simulations and radiation hydrodynamics simulations in terms of macroscopic plasma parameters. We also discuss the role of the kinetic effects in EUV and next-generation BEUV sources.",
keywords = "EUV source, expanding plasma dynamics, kinetic plasma physics, particle-in-cell simulations",
author = "Lezhnin, \{Kirill V.\} and Samuel Totorica and Abdullah Hyder and John Sheil and Versolato, \{Oscar O.\} and Ahmed Diallo and William Fox",
note = "Publisher Copyright: {\textcopyright} 2023 SPIE.; Optical and EUV Nanolithography XXXVI 2023 ; Conference date: 27-02-2023 Through 02-03-2023",
year = "2023",
doi = "10.1117/12.2658454",
language = "English (US)",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Anna Lio",
booktitle = "Optical and EUV Nanolithography XXXVI",
address = "United States",
}