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Ion and vacuum ultraviolet photon beam effects in 193nm photoresist surface roughening: The role of the adamantyl pendant group
Ting Ying Chung, David B. Graves, Florian Weilnboeck, Robert L. Bruce, Gottlieb S. Oehrlein, Mingqi Li, Eric A. Hudson
Research output: Contribution to journal › Article › peer-review
21
Scopus
citations