Investigation of the low-temperature oxidation of n-butanal in a jet-stirred reactor

Handong Liao, Tao Tao, Wenyu Sun, Nils Hansen, Chung K. Law, Bin Yang

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

n-Butanal is a key intermediate formed during the low-temperature oxidation of hydrocarbons and is also a toxic pollutant during the high-temperature oxidation of biofuels. In this work, its low-temperature oxidation chemistry was studied over the temperature range of 500-900K in a jet-stirred reactor (JSR) at 700Torr. Synchrotron vacuum ultraviolet photoionization mass spectrometry was employed to identify and quantify the intermediates. A total of 40 species were detected including some reactive peroxy radicals and hydroperoxide species. Speciation measurements obtained in this work can serve as validation targets for new reaction mechanisms, providing new kinetic insights into the n-butanal low-temperature oxidation. Particularly, the O 2 -addition to the carbonyl radical of n-butanal (n-C 3 H 7 CO) proves to be a competing channel with the direct decomposition, which is supported by our experimental results.

Original languageEnglish (US)
Pages (from-to)453-460
Number of pages8
JournalProceedings of the Combustion Institute
Volume37
Issue number1
DOIs
StatePublished - Jan 1 2019

All Science Journal Classification (ASJC) codes

  • Chemical Engineering(all)
  • Mechanical Engineering
  • Physical and Theoretical Chemistry

Keywords

  • Jet-stirred reactor
  • Oxidation
  • Synchrotron vacuum ultraviolet photoionization mass spectrometry
  • n-Butanal

Fingerprint Dive into the research topics of 'Investigation of the low-temperature oxidation of n-butanal in a jet-stirred reactor'. Together they form a unique fingerprint.

  • Cite this