Abstract
The morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films are studied on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PMMA) coated substrates. The PS-PB copolymers are synthesized to form, in bulk, PB cylinders or spheres in a PS matrix. In thin films, prepared by spin-coating, it is observed that the morphology and ordering of the microdomains are affected by strong wetting constraints and a reduced chain mobility on the substrate. The thinnest self-assembled layer of the copolymer films shows no in-plane microphase separation on both types of substrates. In the case of spherical PS-PB diblock copolymer films, it is observed thatthe ordering of the microdomains is improved in the films on the PMMA substrates, compared to those on the bare substrates. A successful transfer of the microdomain patterns to silicon nitride substrates by a reactive ion etching technique is also demonstrated.
Original language | English (US) |
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Pages (from-to) | 179-184 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 461 |
State | Published - 1997 |
Event | Proceedings of the 1996 MRS Fall Meeting - Boston, MA, USA Duration: Dec 2 1996 → Dec 4 1996 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering