Intrinsic magnetic properties of hexagonal LuFeO3 and the effects of nonstoichiometry

  • Jarrett A. Moyer
  • , Rajiv Misra
  • , Julia A. Mundy
  • , Charles M. Brooks
  • , John T. Heron
  • , David A. Muller
  • , Darrell G. Schlom
  • , Peter Schiffer

Research output: Contribution to journalArticlepeer-review

71 Scopus citations

Abstract

We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO3 (h-LuFeO3) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO3 to have a TN = 147 K and Ms = 0.018 μB/Fe.

Original languageEnglish (US)
Article number012106
JournalAPL Materials
Volume2
Issue number1
DOIs
StatePublished - Jan 2014
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering

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