Intrinsic magnetic properties of hexagonal LuFeO3 and the effects of nonstoichiometry

Jarrett A. Moyer, Rajiv Misra, Julia A. Mundy, Charles M. Brooks, John T. Heron, David A. Muller, Darrell G. Schlom, Peter Schiffer

Research output: Contribution to journalArticlepeer-review

63 Scopus citations


We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO3 (h-LuFeO3) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO3 to have a TN = 147 K and Ms = 0.018 μB/Fe.

Original languageEnglish (US)
Article number012106
JournalAPL Materials
Issue number1
StatePublished - Jan 2014
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering


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