Interference-enhanced Raman scattering in strain characterization of ultra-thin strained SiGe and Si films on insulator

Haizhou Yin, K. D. Hobart, S. R. Shieh, R. L. Peterson, T. S. Duffy, J. C. Sturm

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Fingerprint

Dive into the research topics of 'Interference-enhanced Raman scattering in strain characterization of ultra-thin strained SiGe and Si films on insulator'. Together they form a unique fingerprint.

Material Science

Engineering

Keyphrases