Interface dipole engineering at buried organic-organic semiconductor heterojunctions

Physics & Astronomy

• adhesion 25%
• alignment 47%
• butyric acid 39%
• diamines 40%
• dipole moments 27%
• dipoles 45%
• electronic levels 39%
• energy levels 24%
• engineering 45%
• esters 35%
• heterojunctions 54%
• molecules 16%
• organic semiconductors 69%
• phenyls 33%
• shift 18%
• templates 28%
• vacuum 19%

Engineering & Materials Science

• Adhesion 28%
• Butyric acid 52%
• Dipole moment 48%
• Electron energy levels 35%
• Esters 33%
• Heterojunctions 80%
• Molecules 29%
• Organic semiconductor materials 100%
• Self assembled monolayers 47%
• Vacuum 27%

Chemical Compounds

• Acid 10%
• Dipole 60%
• Dipole Moment 28%
• Energy 14%
• Methyl Ester 27%
• Modification 17%
• Molecule 10%
• Phosphonate 62%
• Self Assembled Monolayer 29%
• Semiconductor 46%
• Statistical Ensemble 30%
• Vacuum 24%
• Work Function 35%