Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Chao Wang; Stephen Y. Chou

doi:10.1016/j.mee.2012.05.051

Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Chao Wang, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO ₂ and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.

Original language	English (US)
Pages (from-to)	693-697
Number of pages	5
Journal	Microelectronic Engineering
Volume	98
DOIs	https://doi.org/10.1016/j.mee.2012.05.051
State	Published - Oct 2012

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Surfaces, Coatings and Films
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

Keywords

Aligned patterning
Compositional resist stack
Fluidic channel
Fluorescence and Raman scattering
Metallic nanostructures
Nanoimprint lithography

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10.1016/j.mee.2012.05.051

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@article{337448eed2b94841a3bfc02c709e6123,

title = "Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack",

abstract = "We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.",

keywords = "Aligned patterning, Compositional resist stack, Fluidic channel, Fluorescence and Raman scattering, Metallic nanostructures, Nanoimprint lithography",

author = "Chao Wang and Chou, {Stephen Y.}",

note = "Funding Information: The authors thank National Institutes of Health (NIH) and National Science Foundation (NSF) for funding support. Copyright: Copyright 2012 Elsevier B.V., All rights reserved.",

year = "2012",

month = oct,

doi = "10.1016/j.mee.2012.05.051",

language = "English (US)",

volume = "98",

pages = "693--697",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

AU - Wang, Chao

AU - Chou, Stephen Y.

PY - 2012/10

Y1 - 2012/10

N2 - We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.

AB - We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.

KW - Aligned patterning

KW - Compositional resist stack

KW - Fluidic channel

KW - Fluorescence and Raman scattering

KW - Metallic nanostructures

KW - Nanoimprint lithography

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DO - 10.1016/j.mee.2012.05.051

M3 - Article

C2 - 23175593

AN - SCOPUS:84865610503

SN - 0167-9317

VL - 98

SP - 693

EP - 697

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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