Initial stages of the reaction of oxygen with Si(1 0 0)

C. Silvestre, M. Shayegan

Research output: Contribution to journalArticle

18 Scopus citations

Abstract

High resolution electron energy loss spectra and work function results are presented for the Si(1 0 0) surface held at 20 K during exposure to O2 and subsequently annealed to 300 K. The loss spectra provide evidence for the presence at 20 K of physisorbed molecular and chemisorbed monatomic oxygen. When the oxygen covered surface is warmed, the physisorbed oxygen evaporates at thkap;35 K. Upon oxygen exposure at 20 K, the work function increases by ≈1.5 eV and decreases only when the surface is annealed above ≈90 K, indicating that certain metastable oxygen species besides the physisorbed molecular oxygen may exist on the surface at low temperatures.

Original languageEnglish (US)
Pages (from-to)735-738
Number of pages4
JournalSolid State Communications
Volume77
Issue number9
DOIs
StatePublished - Mar 1991

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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