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Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O2 and H2O as additive gases

  • Eric J. Tonnis
  • , David B. Graves
  • , Victor H. Vartanian
  • , Laurie Beu
  • , Tom Lii
  • , Rusty Jewett

Research output: Contribution to journal › Article › peer-review

28   Link opens in a new tab Scopus citations

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