Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O2 and H2O as additive gases

Eric J. Tonnis, David B. Graves, Victor H. Vartanian, Laurie Beu, Tom Lii, Rusty Jewett

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Fingerprint

Dive into the research topics of 'Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O2 and H2O as additive gases'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy