In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Zhaoning Yu, He Gao, Stephen Y. Chou

Research output: Contribution to journalArticle

38 Scopus citations

Abstract

To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.

Original languageEnglish (US)
Pages (from-to)4166-4168
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number18
DOIs
StatePublished - Nov 1 2004

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry'. Together they form a unique fingerprint.

  • Cite this