In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Zhaoning Yu; He Gao; Stephen Y. Chou

doi:10.1063/1.1811396

In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Zhaoning Yu, He Gao, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

39 Scopus citations

Abstract

To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.

Original language	English (US)
Pages (from-to)	4166-4168
Number of pages	3
Journal	Applied Physics Letters
Volume	85
Issue number	18
DOIs	https://doi.org/10.1063/1.1811396
State	Published - Nov 1 2004

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.1811396

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@article{c214b66046d640d08c7d3889f52d2f5f,

title = "In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry",

abstract = "To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.",

author = "Zhaoning Yu and He Gao and Chou, {Stephen Y.}",

note = "Funding Information: This work was partially supported by DARPA and ONR. ",

year = "2004",

month = nov,

day = "1",

doi = "10.1063/1.1811396",

language = "English (US)",

volume = "85",

pages = "4166--4168",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "18",

}

TY - JOUR

T1 - In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

AU - Yu, Zhaoning

AU - Gao, He

AU - Chou, Stephen Y.

N1 - Funding Information: This work was partially supported by DARPA and ONR.

PY - 2004/11/1

Y1 - 2004/11/1

N2 - To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.

AB - To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted light intensity is monitored continuously during the imprint process. We use a scalar diffraction model to calculate the diffraction intensity as a function of the mold penetration ratio. Simulations show good agreement with the experimental results. Our results indicate that TRDS offers a powerful characterization tool that can be used for in situ, real-time NIL process control.

UR - http://www.scopus.com/inward/record.url?scp=10044228559&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=10044228559&partnerID=8YFLogxK

U2 - 10.1063/1.1811396

DO - 10.1063/1.1811396

M3 - Article

AN - SCOPUS:10044228559

SN - 0003-6951

VL - 85

SP - 4166

EP - 4168

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 18

ER -

In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry

Abstract

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